CVD high-temperature coating electric furnace (chemical vapor deposition high-temperature coating electric furnace) is a device that uses chemical vapor deposition (CVD) technology to deposit gaseous substances on the surface of substrate materials at high temperatures to form solid thin films. It is widely used in semiconductor, optoelectronic, materials science, nanotechnology and other fields. Let's take a detailed look at the CVD high-temperature coating electric furnace below!

Customer photos of commonly used CVD high-temperature coating electric furnaces (click on the picture to view product details)

1. Equipment principle and structure
working principle
CVD technology uses a high-temperature environment (usually 300 ℃ -1200 ℃) to chemically react gaseous reactants (such as silane, methane, nitrogen, etc.) on the substrate surface, generating solid thin film materials (such as silicon dioxide, silicon nitride, graphene, etc.). For example, when depositing a silicon dioxide film on the surface of a silicon wafer, silane (SiH ₄) reacts with oxygen (O ₂) at high temperatures to generate SiO ₂ and deposits it on the silicon wafer.

Core structure
Reaction chamber: provides a chemical reaction site, usually using high vacuum or low pressure environment to ensure thorough mixing and uniform deposition of reactants.
Heating system: High temperature control is achieved through methods such as resistance wire heating, and temperature uniformity is a key indicator.
Gas system: including gas mixing, flow control, and exhaust gas treatment modules to ensure stable delivery of reaction gases.
Vacuum system: Maintain the vacuum level in the reaction chamber to prevent impurities from interfering with the deposition process.
Control system: Accurately adjust parameters such as temperature, pressure, gas flow rate, etc., and support automated operation.

2. Equipment type and characteristics
tube furnace
Structure: A quartz tube placed horizontally or vertically serves as a reaction chamber, with sealed ends, and sample entry and exit are achieved through sliding or flange connections.
Advantages: Good temperature uniformity, strong sealing, suitable for processing long strip or powder samples.
Application: Preparation of nanomaterials such as graphene and carbon nanotubes, deposition of metal thin films.

PECVD electric furnace (plasma enhanced CVD)
Principle: Introducing plasma on the basis of CVD, reducing reaction temperature and increasing deposition rate.
Advantages: Low temperature deposition, high film quality, suitable for heat sensitive substrate materials.
Applications: solar cells, flat panel displays, microelectronic devices.

3. Core application areas
Semiconductor Manufacturing
Deposition of insulation layers (such as SiO ₂, Si ∝ N ₄), metal layers (such as tungsten, aluminum), and high-k dielectric materials.
Used for epitaxial growth of single crystal silicon and preparation of 3D NAND flash memory structures.

Optoelectronics and Display Technology
Production of thin-film solar cells (such as CIGS, silicon-based thin-film cells).
Deposition of optoelectronic materials for LED and OLED displays to enhance device luminous efficiency.

Nanomaterials and Surface Engineering
Synthesize one-dimensional materials such as nanoparticles and nanowires for use in nanoelectronics and nanomedicine.
Deposition of anti-corrosion and anti-wear coatings on metal and glass surfaces to extend their service life.

Biomedical and Sensors
Manufacturing biosensors and gas sensors to detect cardiovascular disease markers or environmental pollutants.
Preparation of biocompatible thin film materials for medical device coatings.

4. Equipment advantages and selection points
technical advantage
Efficient and energy-saving: The double-layer furnace shell structure is combined with a fan to achieve rapid temperature rise and fall, reducing energy consumption.
Precise control: supports multi parameter collaborative adjustment of temperature, atmosphere, and gas flow rate to meet complex process requirements.
High reliability: Using high-purity materials (such as high-purity corundum pipes) and vacuum flange sealing to ensure airtightness and high temperature resistance.

Selection suggestions
Temperature range: Select according to process requirements (such as PECVD below 600 ℃ and high-temperature tube furnace above 1000 ℃).
Reaction chamber size: Match sample size to avoid space waste or insufficient processing capacity.
Atmosphere control: Confirm whether vacuum, inert gas protection, or reducing atmosphere is needed.
Brand and after-sales service: Priority should be given to manufacturers with industry reputation to ensure equipment stability and after-sales service.

Low vacuum three temperature zone CVD high-temperature coating electric furnace (click on the picture to view product details)

Overall, CVD high-temperature coating electric furnaces have a wide range of application fields. Before customization, it is necessary to communicate the parameters with relevant technical personnel in order to customize CVD high-temperature coating electric furnaces that are more suitable for one's own experiments or production!Click to learn more CVD high-temperature coating electric furnaces! Or click on online customer service to learn more about product information!