Zhengzhou Protech Technology Co., Ltd
phone +86 18037178440
email info@lab-furnace.com
Zhengzhou Protech Technology Co., Ltd
about us
Home > Technical Articles >



The difference between pecvd & cvd

Time:2019-11-27 08:48

The difference between pecvd & cvd

CVD (chemical vapor deposition), refers to the composition and reaction film containing vapor elements of gaseous reactants or liquid reactants required other gas into the reaction chamber, in the process of chemical reaction occurs at the surface of the thin film substrate
Plasma Enhanced Chemical Vapor Deposition, PECVD, is a type of Chemical Vapor Deposition, CVD, in which the chemical reaction is induced by RF power energy either with capacitive coupling or inductive coupling electrodes. There are many variations of PECVD systems with heated substrates, and varying pressure ranges.  The RF frequency normally employed in PECVD is 13.56 MHz
pecvd & cvdpecvd & cvd


  • Three phase electric high temperature muffle furnace
  • Benchtop furnace
  • Three temperature zone inclined tube furnace
  • Touch screen inclined rotary tubular furnace

Leave A Message