PECVD, as a commonly used experimental plasma coating equipment in university laboratories, is favored by university teachers and students due to its lower coating temperature and uniform coating quality. So, what should be noted when choosing PECVD? Let's take a look below!

Experimental PECVD electric furnace with preheating function (click on the image to view product details)

Performance parameter
Deposition film type and quality: Based on research requirements, determine the types of films that the equipment can deposit, such as silicon dioxide, silicon nitride, diamond-like carbon, etc., and investigate their film formation quality, including film uniformity, density, pinhole density, etc. For example, thin films used in semiconductor device manufacturing require high uniformity and density.
Temperature range: The basic temperature of the equipment is usually between 300-500 ° C. The appropriate temperature range should be selected according to specific experimental requirements, and the temperature control accuracy should be high, generally reaching ± 1 ° C, to ensure the consistency of film quality.
Sedimentation rate: Sedimentation rate can affect experimental efficiency, and different application scenarios require different sedimentation rates. For example, in the large-scale preparation of thin films, a higher deposition rate can improve production efficiency, but for some experiments that require high film quality, it may be necessary to appropriately reduce the deposition rate to ensure the performance of the film.
RF power supply: RF PECVD usually uses a 50kHz -13.56MHz frequency band RF power supply. At high frequencies, the ion bombardment in the plasma is strong, resulting in denser deposited films, but also causing significant damage to the substrate; The uniformity of thin films deposited at high frequencies is significantly better than that deposited at low frequencies. At the same time, the output range and stability of RF power should be considered. The higher the power, the greater the ion bombardment energy, which is beneficial for improving the quality of deposited films.
Vacuum system: The vacuum degree has a significant impact on the quality of the film, and generally requires a high level of ultimate vacuum, such as 10 ⁻⁴ Pa or even lower. The pumping speed of the vacuum system is also crucial, as it determines the efficiency of the equipment. Typically, a combination of dry pumps and molecular pumps is used, with dry pumps used for low vacuum and molecular pumps used for high vacuum.

Sample processing capability
Sample size: Select equipment based on commonly used sample sizes in university experiments, such as whether it can handle substrates of 3 inches, 4 inches, 6 inches, or even larger sizes. If the main focus is on researching nanomaterials or small devices, a small sample stage may be sufficient; But if it involves large-scale film deposition or batch processing, a larger sample stage is required.
Sample shape: In addition to common circular or square substrates, it is also necessary to consider whether the equipment can adapt to samples with special shapes, such as curved surfaces, irregular shapes, etc. Some PECVD equipment's sample tables can be specially designed or equipped with corresponding fixtures to fix samples of different shapes.

Automation level and control function
Intelligent control system: equipped with a good intelligent control system, such as operating and monitoring through computer software, can achieve precise control and real-time monitoring of process parameters, including temperature, gas flow rate, RF power, vacuum degree, etc. It can also pre store multiple process curves for easy repetition of different experiments.
Remote control: Consider whether the equipment supports remote control function, which is very convenient for the management and use of university laboratories. It can start, stop, adjust parameters and other operations of the equipment without entering the experimental site, improving the flexibility and efficiency of the experiment.

Gas and flow control system
Gas types: Determine the types of gases that the equipment can support according to experimental needs. Common process gases include SiH ₄, NH ∝, N ₂ O, N ₂, etc. Some special thin film deposition may require the use of multiple gases, so the gas path system of the equipment should have sufficient channels to supply different gases.
Flow control accuracy: Accurate control of gas flow is crucial for the deposition quality of thin films, and is usually achieved using mass flow meters. It is required that the flow control accuracy reach a high level, such as ≤± 2% (full range).

Safety performance
Gas safety: Equipped with comprehensive gas safety protection devices, such as gas leak detection, alarm systems, and emergency shut-off valves, to prevent safety accidents caused by toxic, flammable, and explosive gas leaks.
Electrical safety: Equipment should have good electrical insulation performance and grounding measures to prevent electric shock to operators. At the same time, there should be protection functions such as overcurrent, overvoltage, and overheating to ensure the safety of equipment and experimental personnel.

Brand and after-sales service
Brand reputation: Choosing equipment from well-known brands usually provides more assurance in terms of quality, performance, and stability. You can refer to the usage evaluation and experience of other universities or research institutions to understand the reputation and market recognition of different brands. Companies such as Northern Huachuang have a high reputation and good reputation in the field of semiconductor equipment.
After sales service: Good after-sales service is an important guarantee for the long-term stable operation of equipment. Including equipment installation, debugging, training, maintenance, spare parts supply, etc. Suppliers should have a professional technical support team that can respond promptly and solve any problems that arise during the use of the equipment.

Budget
Equipment prices: PECVD equipment of different brands, models, and configurations have significant price differences, ranging from tens of thousands to millions of yuan. When choosing, the appropriate equipment grade and specifications should be determined based on the university's research budget. But price alone cannot be the only selection criterion, and factors such as equipment performance, quality, and after-sales service should be comprehensively considered.
Operating costs: In addition to the procurement cost of equipment, the operating costs of equipment should also be considered, including electricity consumption, gas consumption, maintenance costs, etc. For example, some high-performance devices may require more electricity and expensive process gases, which can increase long-term operating costs.

Experimental PECVD electric furnace that can rotate and tilt (click on the image to view product details)

In general, when choosing a PECVD electric furnace for a university, the above points should be noted. Before choosing, you can communicate with relevant technical personnel or business managers about the required configuration to ensure that the coating results better meet your requirements!Click to learn more PECVD devices! Or click on online customer service to learn more about product information!