Multi channel CVD coating furnace is a commonly used equipment that combines chemical vapor deposition (CVD) technology with multi-channel gas path control, mainly used for depositing high-purity and high-performance thin films or coatings on the surface of solid substrates. Let's take a detailed look at the multi-channel CVD coating electric furnace below!

A commonly used four channel CVD coating electric furnace (click on the image to view product details)

1. Equipment composition
A multi-channel CVD coating electric furnace typically consists of the following core components:
High temperature vacuum tube furnace: provides the high temperature environment required for the reaction, with a temperature range of hundreds to thousands of degrees Celsius, ensuring that the reaction gas undergoes chemical reactions on the surface of the substrate.
Multi channel gas path system: equipped with multiple independent gas paths, different reaction gases (such as silane, ammonia, etc.) can be introduced simultaneously or in a timed manner. The gas flow rate and proportion are precisely controlled by a mass flow meter (MFC) to achieve gradient design or doping control of the film composition.
Vacuum system: optional molecular pump or rotary vane pump can be used to maintain a high vacuum environment during the reaction process (with a vacuum degree of up to 10 ⁻ Pa), effectively removing impurities such as oxygen and water vapor from the air, and avoiding film oxidation or contamination.
Control system: Integrated temperature, pressure, and gas flow multi parameter feedback regulation, supporting programmed temperature control and automatic heating/cooling to ensure the stability and controllability of process parameters.

2. Working principle
The multi-channel CVD coating electric furnace achieves thin film deposition through the following steps:
Gas Premixing: Premixing multiple reaction gases in predetermined proportions, or introducing them separately into the reaction chamber through independent gas pathways.
Chemical reaction: Under high temperature and vacuum environment, the gas-phase precursor decomposes and deposits on the surface of the substrate, forming a solid thin film. For example, the reaction between silane (SiH ₄) and ammonia (NH ∝) can generate silicon nitride (Si ∝ N ₄) thin films.
Thin film growth: By controlling the reaction conditions (such as temperature, pressure, gas flow rate), the thin film is uniformly grown to form the desired structure (such as columnar crystals, nanowires).
Post processing: After deposition, in-situ annealing can be performed to eliminate internal stress in the film and reduce the risk of cracking.

3. Application Fields
Multi channel CVD coating electric furnaces have wide applications in multiple high-end fields:
Semiconductor manufacturing: deposition of silicon-based thin films, silicon nitride, aluminum oxide, etc., used for insulation layers, metal interconnect layers, and doping layers in integrated circuits, sensors, and other devices.
Optoelectronics: Preparation of optical thin films (such as anti reflective films, anti reflective films), fiber optic coatings, solar cell materials (such as silicon-based thin films, CdTe, CIGS), etc.
Materials Science: Synthesize coatings, ceramic films, nanomaterials (such as carbon nanotubes, graphene), etc. to enhance material properties.
Aerospace: Deposition of coatings such as silicon carbide and yttria stabilized zirconia (YSZ) for rocket engine nozzles and hypersonic aircraft surfaces, capable of withstanding extreme high temperature environments.
Biomedical: Deposition of silver (Ag), copper (Cu) antibacterial coatings, or hydroxyapatite (HA) bioactive coatings on the surface of orthopedic implants to promote bone cell adhesion.

4. Advantages and Characteristics
The multi-channel CVD coating electric furnace has the following advantages compared to traditional equipment:
Highly controllable: precise control of reaction conditions (such as temperature, pressure, gas flow rate) to achieve customized design of film composition, structure, and performance.
Uniformity and repeatability: Through system optimization and control, ensure the uniformity and inter batch repeatability of film deposition, suitable for large-scale industrial production.
High purity preparation: Vacuum environment suppresses pollution, reduces gas molecule interference, and is suitable for preparing high-purity metal, semiconductor, or ceramic thin films.
Multi functional compatibility: Supports variant technologies such as PECVD (plasma enhanced CVD) and can deposit thin films of refractory materials (such as silicon carbide and gallium nitride).
Flexibility of substrate shape: Suitable for flat, curved, or complex structural substrates (such as fiber optic coatings, aircraft engine blade coatings).

5. Selection suggestions
When choosing a multi-channel CVD coating electric furnace, the following factors should be considered comprehensively:
Process accuracy: Select equipment with high-precision temperature control (such as 30 stage program temperature control) and gas flow control (such as MFC) according to the requirements of film composition, thickness, and uniformity.
Material type: Choose equipment with strong compatibility for different substrates (such as silicon, ceramics, metals) and thin film materials (such as silicon nitride, aluminum oxide, graphene).
Budget constraint: Balance equipment performance and cost based on laboratory research and development or industrial production needs. The laboratory can choose a small vacuum CVD electric furnace, while industrial production prioritizes modular design equipment for quick changeover and capacity expansion.
Special requirements: If it is necessary to prepare superhard coatings (such as diamond) or special structured thin films, plasma deposition PECVD technology or equipment with temperature gradient control can be selected.

Multi temperature zone multi-channel CVD coating electric furnace (click on the image to view product details)

6. Summary
The multi-channel CVD coating electric furnace has numerous advantages and application fields, and is highly favored by institutions such as university laboratories and industrial and mining enterprise laboratories. However, it is recommended to communicate the parameters with relevant technical personnel before choosing, so as to customize a multi-channel CVD coating electric furnace that is more suitable for one's own production or experimental needs!Click to learn more CVD devices! Or click on online customer service to learn more about product information!