When choosing a rotatable tilted PECVD (plasma enhanced chemical vapor deposition) equipment, a comprehensive evaluation should be conducted from four dimensions: core performance, functional adaptability, operational economy, and user-friendly operation. Let's take a detailed look below!

Commonly used rotatable tilted PECVD electric furnace (click on the image to view product details)

1. Core performance: assurance of sedimentation quality and efficiency
Temperature control accuracy
Key indicators: The temperature control accuracy should reach ± 1 ℃ to ensure stable film growth conditions.
Technical implementation: Adopting PID automatic control and self-tuning function, supporting more than 30 programmable temperature rise and fall programs, adapting to different material and process requirements.
Industry case: The working temperature of commonly used equipment in the photovoltaic industry is 400-500 ℃, and the continuous operating temperature is ≤ 1100 ℃ to avoid high temperature damage to the substrate material.

Plasma uniformity
Technical principle: By generating high-density plasma through high-frequency electric field, the entire experimental chamber is placed in the glow zone, eliminating the instability problem of traditional plasma.
Effect verification: The uniformity of film thickness is good, meeting the needs of large-scale production.

Gas flow and pressure control
System configuration: Multi channel mass flow meter (MFC), supporting 1-6 gas mixing ratios, independent control or proportional adjustment.
Pressure range: Supports switching from low-pressure to atmospheric pressure processes to meet different deposition reaction requirements.

2. Functional adaptability: meeting diverse process requirements
Rotating and tilting mechanism
Rotation function: The furnace tube rotates continuously 360 ° with adjustable speed, allowing the material to fully contact with gas and plasma, and improving reaction uniformity.
Tilt function: Tilt angle of 0-35 ° (some devices can reach 0-15 °), convenient for material feeding and reducing material residue.
Application scenario: Uniform growth of products on the surface of granular samples, such as graphene preparation and powder material coating.

Material Compatibility
Deposition materials: Support the deposition of various dielectric films such as silicon-based thin films, silicon nitride, silicon dioxide, aluminum oxide, etc., expanding the design space of battery structures (such as stacked batteries, back passivation batteries).
Precursor compatibility: It can adapt to gaseous, liquid or solid precursors, and flexibly select deposition materials and optimize process conditions.

Scalability of process mode
Multi technology integration: can be combined with technologies such as ALD (Atomic Layer Deposition) to form complex multilayer structures or achieve specific functions.
Customization options: Customize the furnace tube size (such as Φ 50-150mm) and temperature zone length (such as 200mm for a single temperature zone or a combination of multiple temperature zones) according to the needs, and adapt to different sample sizes and process flows.

3. Operational economy: reduce long-term usage costs
equipment cost
Price range: The prices of different brands and models of equipment vary greatly, and it is necessary to choose a cost-effective solution based on the budget.
Selection suggestion: Prioritize equipment with low operating and maintenance costs while ensuring performance.

operating cost
Energy consumption control: Single temperature zone equipment, using air or water cooling methods to reduce power consumption.
Gas consumption: Optimize gas path design to reduce process gas waste, such as using sealed mobile cabinets connected to ultra clean stainless steel pipes.
Maintenance cost: Choose modular design equipment to facilitate the replacement of vulnerable parts (such as quartz furnace tubes and push rods) and reduce maintenance costs.

4. User friendliness: Improve experimental efficiency and safety
intelligent control system
Operation interface: rotatable LCD touch screen, supporting real-time monitoring and adjustment of process parameters.
Data function: It has data recording and analysis functions, can pre store multiple process curves, and is convenient for repeated experiments and result tracing.

Safety and Environmental Design
Security protection: Built in functions such as overheating alarm, overcurrent protection, and disconnection prompt ensure stable operation of the equipment.
Environmental requirements: Adopting a combination of dry pump and molecular pump vacuum system to reduce gas impurity emissions, in line with the trend of green manufacturing.

Spatial adaptability
Equipment size: Choose the appropriate size according to the laboratory space layout, such as furnace tube length of 800-1600mm and diameter of Φ 50-150mm.
Integration capability: Ensure that the equipment can seamlessly integrate with other experimental equipment (such as vacuum systems, gas supply devices) to improve overall work efficiency.

Customized Mini Rotating Tilt PECVD Electric Furnace (Click on the image to view product details)

In general, when choosing a tilted PECVD, attention should be paid to the above aspects. Before choosing, you can communicate with relevant technical personnel about the parameters you want, so as to customize a PECVD electric furnace that is more suitable for your needs!Click to learn more PECVD devices! Or click on online customer service to learn more about product information!